HOME > 論文 > 書誌詳細Selective etching of hexagonal boron nitride by high-pressure CF4 plasma for individual one-dimensional ohmic contacts to graphene layersYuta Seo, Satoru Masubuchi, Eisuke Watanabe, Momoko Onodera, Rai Moriya, Kenji Watanabe, Takashi Taniguchi, Tomoki Machida. Applied Physics Letters 117 [24] 243101. 2020.https://doi.org/10.1063/5.0022557 NIMS著者渡邊 賢司谷口 尚Materials Data Repository (MDR)上の本文・データセット作成時刻: 2020-12-16 03:00:17 +0900更新時刻: 2024-03-31 10:45:02 +0900