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Selective etching of hexagonal boron nitride by high-pressure CF4 plasma for individual one-dimensional ohmic contacts to graphene layers

Yuta Seo, Satoru Masubuchi, Eisuke Watanabe, Momoko Onodera, Rai Moriya, Kenji Watanabe, Takashi Taniguchi, Tomoki Machida.
Applied Physics Letters 117 [24] 243101. 2020.

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    Created at: 2020-12-16 03:00:17 +0900Updated at: 2024-05-01 05:43:18 +0900

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