HOME > Article > DetailSelective etching of hexagonal boron nitride by high-pressure CF4 plasma for individual one-dimensional ohmic contacts to graphene layersYuta Seo, Satoru Masubuchi, Eisuke Watanabe, Momoko Onodera, Rai Moriya, Kenji Watanabe, Takashi Taniguchi, Tomoki Machida. Applied Physics Letters 117 [24] 243101. 2020.https://doi.org/10.1063/5.0022557 NIMS author(s)WATANABE, KenjiTANIGUCHI, TakashiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2020-12-16 03:00:17 +0900Updated at: 2024-03-31 10:45:02 +0900