Selective etching of hexagonal boron nitride by high-pressure CF4 plasma for individual one-dimensional ohmic contacts to graphene layers
Author(s) | Yuta Seo, Satoru Masubuchi, Eisuke Watanabe, Momoko Onodera, Rai Moriya, Kenji Watanabe, Takashi Taniguchi, Tomoki Machida. |
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Journal title | Applied Physics Letters 117 [24] 243101 ISSN: 00036951, 10773118 ESI category: PHYSICS |
Publisher | AIP Publishing |
Year of publication | 2020 |
Language | English |
DOI | https://doi.org/10.1063/5.0022557 |
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