Selective etching of hexagonal boron nitride by high-pressure CF4 plasma for individual one-dimensional ohmic contacts to graphene layers

著者	Yuta Seo, Satoru Masubuchi, Eisuke Watanabe, Momoko Onodera, Rai Moriya, Kenji Watanabe, Takashi Taniguchi, Tomoki Machida.
掲載誌名	Applied Physics Letters 117 [24] 243101 ISSN: 00036951, 10773118 ESIでのカテゴリ: PHYSICS
出版社	AIP Publishing
発表年	2020
言語	English
DOI	https://doi.org/10.1063/5.0022557
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