1D Crystallographic Etching of Few‐Layer WS<sub>2</sub>

Shisheng Li; Yung‐Chang Lin; Yiling Chiew; Yunyun Dai; Zixuan Ning; Yaming Zhang; Hideaki Nakajima; Hong En Lim; Jing Wu; Yasuhisa Neitoh; Toshiya Okazaki; Yang Sun; Zhipei Sun; Kazu Suenaga; Yoshiki Sakuma; Kazuhito Tsukagoshi; Takaaki Taniguchi; Shisheng Li; Yung‐Chang Lin; Yiling Chiew; Yunyun Dai; Zixuan Ning; Yaming Zhang; Hideaki Nakajima; Hong En Lim; Jing Wu; Yasuhisa Neitoh; Toshiya Okazaki; Yang Sun; Zhipei Sun; Kazu Suenaga; Yoshiki Sakuma; Kazuhito Tsukagoshi; Takaaki Taniguchi

doi:10.1002/adfm.202405665

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1D Crystallographic Etching of Few‐Layer WS₂

Shisheng Li, Yung‐Chang Lin, Yiling Chiew, Yunyun Dai, Zixuan Ning, Yaming Zhang, Hideaki Nakajima, Hong En Lim, Jing Wu, Yasuhisa Neitoh, Toshiya Okazaki, Yang Sun, Zhipei Sun, Kazu Suenaga, Yoshiki Sakuma, Kazuhito Tsukagoshi, Takaaki Taniguchi.

Advanced Functional Materials 34 [46] 2405665. 2024.

https://doi.org/10.1002/adfm.202405665

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作成時刻: 2024-11-27 17:35:25 +0900 更新時刻: 2025-04-02 04:32:07 +0900

1D Crystallographic Etching of Few‐Layer WS2

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

1D Crystallographic Etching of Few‐Layer WS₂