Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy

C. Papp, G. Conti, B. Balke, S. Ueda, Y. Yamashita, H. Yoshikawa, Y. S. Uritsky, K. Kobayashi, C. S. Fadley.

Journal of Applied Physics 112 [11] 114501. 2012.

https://doi.org/10.1063/1.4765720

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作成時刻: 2016-05-24 16:30:56 +0900更新時刻: 2024-12-08 07:19:11 +0900

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