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Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy

C. Papp, G. Conti, B. Balke, S. Ueda, Y. Yamashita, H. Yoshikawa, Y. S. Uritsky, K. Kobayashi, C. S. Fadley.
Journal of Applied Physics 112 [11] 114501. 2012.
https://doi.org/10.1063/1.4765720

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