Strain-free thin film growth of vanadium dioxide deposited on 2D atomic layered material of hexagonal boron nitride investigated by their thickness dependence of insulator–metal transition behavior | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Strain-free thin film growth of vanadium dioxide deposited on 2D atomic layered material of hexagonal boron nitride investigated by their thickness dependence of insulator–metal transition behavior

Boyuan Yu, Shingo Genchi, Kenji Watanabe, Takashi Taniguchi, Hidekazu Tanaka.

Applied Physics Express 18 [2] 025502. 2025.

https://doi.org/10.35848/1882-0786/adaf09

Open Access IOP Publishing (Publisher)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2025-02-23 03:10:50 +0900 更新時刻: 2025-04-26 04:33:58 +0900

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