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Operando hard X-ray photoelectron spectroscopy study of buried interface chemistry of Au/InO1.16C0.04/Al2O3/p+-Si stacks

著者Ibrahima Gueye, Riku Kobayashi, Shigenori Ueda, Toshihide Nabatame, Kazuhito Tsukagoshi, Atsushi Ogura, Takahiro Nagata.
掲載誌名Applied Surface Science 593 153272
ISSN: 01694332
ESIでのカテゴリ: MATERIALS SCIENCE
出版社Elsevier BV
発表年2022
言語English
DOIhttps://doi.org/10.1016/j.apsusc.2022.153272
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