HOME > 論文 > 書誌詳細Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gasTakayoshi Oshima, Yuichi Oshima. Applied Physics Letters 122 [16] 162102. 2023.https://doi.org/10.1063/5.0138736 Open Access AIP Publishing (Publisher) Materials Data Repository (MDR) NIMS著者大島 孝仁大島 祐一Materials Data Repository (MDR)上の本文・データセットMDRavailable Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas 作成時刻: 2023-04-21 05:51:59 +0900更新時刻: 2024-04-19 03:02:28 +0900
