HOME > Article > DetailPlasma-free dry etching of (001) β-Ga2O3 substrates by HCl gasTakayoshi Oshima, Yuichi Oshima. Applied Physics Letters 122 [16] 162102. 2023.https://doi.org/10.1063/5.0138736 Open Access AIP Publishing (Publisher) Materials Data Repository (MDR) NIMS author(s)OSHIMA, TakayoshiOSHIMA, YuichiFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas Created at: 2023-04-21 05:51:59 +0900Updated at: 2024-05-02 03:02:33 +0900
