HOME > 論文 > 書誌詳細Production of Cu2O nanoparticles in SiO2 by ion implantation and two-step annealing at different oxygen pressuresH Amekura, O A Plaksin, K Kono, Y Takeda, N Kishimoto. Journal of Physics D: Applied Physics 39 [16] 3659-3664. 2006.https://doi.org/10.1088/0022-3727/39/16/020 NIMS著者雨倉 宏河野 健一郎武田 良彦Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 15:00:05 +0900 更新時刻: 2026-02-23 05:42:38 +0900
