HOME > 論文 > 書誌詳細Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithographyTakayoshi Oshima. Japanese Journal of Applied Physics 62 [1] 018004. 2023.https://doi.org/10.35848/1347-4065/acb0b3 Open Access IOP Publishing (Publisher) Materials Data Repository (MDR) NIMS著者大島 孝仁Materials Data Repository (MDR)上の本文・データセットMDRavailable Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography 作成時刻: 2023-01-25 03:35:40 +0900更新時刻: 2025-01-16 07:00:32 +0900
