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Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography

Author(s)Takayoshi Oshima.
Journal titleJapanese Journal of Applied Physics 62 [1] 018004
ISSN: 13474065, 00214922
ESI category: PHYSICS
PublisherIOP Publishing
Year of publication2023
LanguageEnglish
DOIhttps://doi.org/10.35848/1347-4065/acb0b3
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