HOME > Article > DetailSelf-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithographyTakayoshi Oshima. Japanese Journal of Applied Physics 62 [1] 018004. 2023.https://doi.org/10.35848/1347-4065/acb0b3 Open Access IOP Publishing (Publisher) Materials Data Repository (MDR) NIMS author(s)OSHIMA, TakayoshiFulltext and dataset(s) on Materials Data Repository (MDR)MDRavailable Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography Created at: 2023-01-25 03:35:40 +0900Updated at: 2024-04-19 03:00:48 +0900
