HOME > 論文 > 書誌詳細Effect of the temperature and HCl partial pressure on selective-area gas etching of (001) β-Ga2O3Yuichi Oshima, Takayoshi Oshima. Japanese Journal of Applied Physics 62 [8] 080901. 2023.https://doi.org/10.35848/1347-4065/acee3b Open Access Materials Data Repository (MDR) NIMS著者大島 祐一大島 孝仁Materials Data Repository (MDR)上の本文・データセットMDRavailable Effect of temperature and HCl partial pressure on the selective area gas etching of (001) β-Ga2O3 作成時刻: 2023-08-25 03:31:13 +0900更新時刻: 2025-03-19 07:07:50 +0900
