Observation of strain relaxing in nanoscale WS<sub>2</sub> monolayers grown on SiO<sub>2</sub>/Si by organic solvent treatment | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Observation of strain relaxing in nanoscale WS₂ monolayers grown on SiO₂/Si by organic solvent treatment

Taketo Aihara, Ruoxi Wang, Xu Yang, Yoshiki Sakuma, Ayako Omura Okano, Michio Ikezawa.

Japanese Journal of Applied Physics 61 [7] 071003. 2022.

https://doi.org/10.35848/1347-4065/ac78af

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作成時刻: 2022-07-15 03:17:33 +0900更新時刻: 2025-03-11 08:20:46 +0900

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