HOME > 論文 > 書誌詳細Observation of strain relaxing in nanoscale WS2 monolayers grown on SiO2/Si by organic solvent treatmentTaketo Aihara, Ruoxi Wang, Xu Yang, Yoshiki Sakuma, Ayako Omura Okano, Michio Ikezawa. Japanese Journal of Applied Physics 61 [7] 071003. 2022.https://doi.org/10.35848/1347-4065/ac78af NIMS著者佐久間 芳樹Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-07-15 03:17:33 +0900更新時刻: 2024-03-31 16:44:29 +0900
