Observation of strain relaxing in nanoscale WS2 monolayers grown on SiO2/Si by organic solvent treatment

著者	Taketo Aihara, Ruoxi Wang, Xu Yang, Yoshiki Sakuma, Ayako Omura Okano, Michio Ikezawa.
掲載誌名	Japanese Journal of Applied Physics 61 [7] 071003 ISSN: 13474065, 00214922 ESIでのカテゴリ: PHYSICS
出版社	IOP Publishing
発表年	2022
言語	English
DOI	https://doi.org/10.35848/1347-4065/ac78af
この文献をMendeleyにインポート