HOME > Article > DetailObservation of strain relaxing in nanoscale WS2 monolayers grown on SiO2/Si by organic solvent treatmentTaketo Aihara, Ruoxi Wang, Xu Yang, Yoshiki Sakuma, Ayako Omura Okano, Michio Ikezawa. Japanese Journal of Applied Physics 61 [7] 071003. 2022.https://doi.org/10.35848/1347-4065/ac78af NIMS author(s)SAKUMA, YoshikiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-07-15 03:17:33 +0900Updated at: 2024-05-01 08:23:16 +0900