HOME > 論文 > 書誌詳細Epitaxial growth of high dielectric constant lead-free relaxor ferroelectric for high-temperature operational film capacitorSomu Kumaragurubaran, Takahiro Nagata, Yoshifumi Tsunekawa, Kenichiro Takahashi, Sung-Gi Ri, Setsu Suzuki, Toyohiro Chikyow. Thin Solid Films 592 29-33. 2015.https://doi.org/10.1016/j.tsf.2015.09.012 NIMS著者長田 貴弘知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 18:10:00 +0900 更新時刻: 2026-09-28 04:22:17 +0900
