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Epitaxial growth of high dielectric constant lead-free relaxor ferroelectric for high-temperature operational film capacitor

Somu Kumaragurubaran, Takahiro Nagata, Yoshifumi Tsunekawa, Kenichiro Takahashi, Sung-Gi Ri, Setsu Suzuki, Toyohiro Chikyow.
Thin Solid Films 592 29-33. 2015.
https://doi.org/10.1016/j.tsf.2015.09.012
Open Access Elsevier BV (Publisher)

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    Created at: 2016-05-24 18:10:00 +0900Updated at: 2024-03-29 19:11:27 +0900

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