HOME > Article > DetailSi-incorporated amorphous indium oxide thin-film transistorsShinya Aikawa, Toshihide Nabatame, Kazuhito Tsukagoshi. Japanese Journal of Applied Physics 58 [9] 090506. 2019.https://doi.org/10.7567/1347-4065/ab2b79 NIMS author(s)NABATAME, ToshihideTSUKAGOSHI, KazuhitoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2019-07-24 03:00:19 +0900Updated at: 2024-03-31 00:37:26 +0900
