HOME > 論文 > 書誌詳細Chlorine-based inductive coupled plasma etching of α-Ga2O3(塩素系ICPによるα-Ga2O3のエッチング)Zhe (Ashley) Jian, Yuichi Oshima, Shawn Wright, Kevin Owen, Elaheh Ahmadi. Semiconductor Science and Technology 34 [3] 035006. 2019.https://doi.org/10.1088/1361-6641/aafeb2 NIMS著者大島 祐一Materials Data Repository (MDR)上の本文・データセット作成時刻: 2019-03-01 12:16:37 +0900 更新時刻: 2026-09-29 05:28:14 +0900
