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Chlorine-based inductive coupled plasma etching of α-Ga2O3
(塩素系ICPによるα-Ga2O3のエッチング)

Zhe (Ashley) Jian, Yuichi Oshima, Shawn Wright, Kevin Owen, Elaheh Ahmadi.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2019-03-01 12:16:37 +0900 Updated at :2021-03-08 20:14:01 +0900

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