HOME > Article > DetailChlorine-based inductive coupled plasma etching of α-Ga2O3(塩素系ICPによるα-Ga2O3のエッチング)Zhe (Ashley) Jian, Yuichi Oshima, Shawn Wright, Kevin Owen, Elaheh Ahmadi. Semiconductor Science and Technology 34 [3] 035006. 2019.https://doi.org/10.1088/1361-6641/aafeb2 NIMS author(s)OSHIMA, YuichiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2019-03-01 12:16:37 +0900Updated at: 2024-03-31 01:28:18 +0900