HOME > 論文 > 書誌詳細Chlorine-based dry etching ofβ-Ga2O3( β-Ga2O3の塩素系ドライエッチング)Jack E Hogan, Stephen W Kaun, Elaheh Ahmadi, Yuichi Oshima, James S Speck. Semiconductor Science and Technology 31 [6] 065006. 2016.https://doi.org/10.1088/0268-1242/31/6/065006 NIMS著者大島 祐一Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 18:08:52 +0900更新時刻: 2024-04-02 06:20:42 +0900
