HOME > Article > DetailChlorine-based dry etching ofβ-Ga2O3( β-Ga2O3の塩素系ドライエッチング)Jack E Hogan, Stephen W Kaun, Elaheh Ahmadi, Yuichi Oshima, James S Speck. Semiconductor Science and Technology 31 [6] 065006. 2016.https://doi.org/10.1088/0268-1242/31/6/065006 NIMS author(s)OSHIMA, YuichiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 18:08:52 +0900Updated at: 2024-04-02 06:20:42 +0900
