Electron beam directed etching of hexagonal boron nitride

Christopher Elbadawi; Trong Toan Tran; Miroslav Kolíbal; Tomáš Šikola; John Scott; Qiran Cai; Lu Hua Li; Takashi Taniguchi; Kenji Watanabe; Milos Toth; Igor Aharonovich; Charlene Lobo; Christopher Elbadawi; Trong Toan Tran; Miroslav Kolíbal; Tomáš Šikola; John Scott; Qiran Cai; Lu Hua Li; Takashi Taniguchi; Kenji Watanabe; Milos Toth; Igor Aharonovich; Charlene Lobo

doi:10.1039/c6nr04959a

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Electron beam directed etching of hexagonal boron nitride

Christopher Elbadawi, Trong Toan Tran, Miroslav Kolíbal, Tomáš Šikola, John Scott, Qiran Cai, Lu Hua Li, Takashi Taniguchi, Kenji Watanabe, Milos Toth, Igor Aharonovich, Charlene Lobo.

Nanoscale 8 [36] 16182-16186. 2016.

https://doi.org/10.1039/c6nr04959a

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作成時刻: 2016-12-10 22:50:52 +0900 更新時刻: 2026-10-29 05:02:25 +0900