Electron beam directed etching of hexagonal boron nitride

Christopher Elbadawi; Trong Toan Tran; Miroslav Kolíbal; Tomáš Šikola; John Scott; Qiran Cai; Lu Hua Li; Takashi Taniguchi; Kenji Watanabe; Milos Toth; Igor Aharonovich; Charlene Lobo; Christopher Elbadawi; Trong Toan Tran; Miroslav Kolíbal; Tomáš Šikola; John Scott; Qiran Cai; Lu Hua Li; Takashi Taniguchi; Kenji Watanabe; Milos Toth; Igor Aharonovich; Charlene Lobo

doi:10.1039/c6nr04959a

Electron beam directed etching of hexagonal boron nitride

Christopher Elbadawi, Trong Toan Tran, Miroslav Kolíbal, Tomáš Šikola, John Scott, Qiran Cai, Lu Hua Li, Takashi Taniguchi, Kenji Watanabe, Milos Toth, Igor Aharonovich, Charlene Lobo.

Nanoscale 8 [36] 16182-16186. 2016.

https://doi.org/10.1039/c6nr04959a

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-12-10 22:50:52 +0900 Updated at: 2026-10-29 05:02:25 +0900