HOME > 論文 > 書誌詳細NF3 and F2 gas fluorination of GaN surface and Pt/GaN interface analyzed by hard X-ray photoelectron spectroscopyAsahiko Matsuda, Takashi Teramoto, Takahiro Nagata, Dominic Gerlach, Peng Shen, Shigenori Ueda, Takako Kimura, Christian Dussarrat, Toyohiro Chikyow. Applied Surface Science 659 159941. 2024.https://doi.org/10.1016/j.apsusc.2024.159941 Open Access Elsevier BV (Publisher) Materials Data Repository (MDR) NIMS著者松田 朝彦長田 貴弘上田 茂典知京 豊裕Materials Data Repository (MDR)上の本文・データセットMDRavailable NF3 and F2 gas fluorination of GaN surface and Pt/GaN interface analyzed by hard X-ray photoelectron spectroscopy 作成時刻: 2024-03-28 09:53:17 +0900 更新時刻: 2026-03-23 09:48:11 +0900
