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NF3 and F2 gas fluorination of GaN surface and Pt/GaN interface analyzed by hard X-ray photoelectron spectroscopy

Asahiko Matsuda, Takashi Teramoto, Takahiro Nagata, Dominic Gerlach, Peng Shen, Shigenori Ueda, Takako Kimura, Christian Dussarrat, Toyohiro Chikyow.
Applied Surface Science 659 159941. 2024.

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Materials Data Repository (MDR)上の本文・データセット


    作成時刻: 2024-03-28 09:53:17 +0900更新時刻: 2024-04-30 06:44:01 +0900

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