HOME > 論文 > 書誌詳細Perspective: Highly ordered MoS2 thin films grown by multi-step chemical vapor deposition process(CVD法による高配向MoS2薄膜の成長)S. N. Heo, Y. Ishiguro, R. Hayakawa, T. Chikyow, Y. Wakayama. APL Materials 4 [3] 030901. 2016.https://doi.org/10.1063/1.4943288 Open Access AIP Publishing (Publisher) NIMS著者早川 竜馬知京 豊裕若山 裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-10-26 15:42:35 +0900更新時刻: 2024-03-29 19:11:40 +0900