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Perspective: Highly ordered MoS2 thin films grown by multi-step chemical vapor deposition process
(CVD法による高配向MoS2薄膜の成長)

S. N. Heo, Y. Ishiguro, R. Hayakawa, T. Chikyow, Y. Wakayama.
APL Materials 4 [3] 030901. 2016.
https://doi.org/10.1063/1.4943288
Open Access AIP Publishing (Publisher)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2016-10-26 15:42:35 +0900Updated at: 2024-03-29 19:11:40 +0900

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