HOME > Article > DetailInfluence of Oxygen Transfer in Hf-based High-k Dielectrics on Flatband Voltage Shift(Hfからなるhigh-k誘電体で酸素移動がフラットバンド電圧シフトへ及ぼす影響)Toshihide Nabatame, Masayuki Kimura, Hiroyuki Yamada, Akihiko Ohi, Tomoji Ohishi, Toyohiro Chikyow. Thin Solid Films 520 [8] 3387-3391. 2012.https://doi.org/10.1016/j.tsf.2011.10.086 NIMS author(s)NABATAME, ToshihideOHI, AkihikoCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2018-06-08 21:32:15 +0900 Updated at: 2026-11-04 05:45:18 +0900