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Influence of Oxygen Transfer in Hf-based High-k Dielectrics on Flatband Voltage Shift
(Hfからなるhigh-k誘電体で酸素移動がフラットバンド電圧シフトへ及ぼす影響)

Toshihide Nabatame, Masayuki Kimura, Hiroyuki Yamada, Akihiko Ohi, Tomoji Ohishi, Toyohiro Chikyow.
Thin Solid Films 520 [8] 3387-3391. 2012.

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    Created at: 2018-06-08 21:32:15 +0900 Updated at: 2026-11-04 05:45:18 +0900

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