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Fullerene Nanostructure-Coated Channels Activated by Electron Beam Lithography for Resistance Switching

著者Mihiro Takeuchi, Yukiya Umeta, Hiroshi Suga, Takatsugu Wakahara, Ying-Chiao Wang, Yasuhisa Naitoh, Katsunori Wakabayashi, Kazuhito Tsukagoshi.
掲載誌名ACS Applied Nano Materials 5 [5] 6430-6437
ISSN: 25740970
出版社American Chemical Society (ACS)
発表年2022
言語English
DOIhttps://doi.org/10.1021/acsanm.2c00523
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