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Fullerene Nanostructure-Coated Channels Activated by Electron Beam Lithography for Resistance Switching

Mihiro Takeuchi, Yukiya Umeta, Hiroshi Suga, Takatsugu Wakahara, Ying-Chiao Wang, Yasuhisa Naitoh, Katsunori Wakabayashi, Kazuhito Tsukagoshi.
ACS Applied Nano Materials 5 [5] 6430-6437. 2022.
https://doi.org/10.1021/acsanm.2c00523

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    Created at: 2022-06-03 03:12:54 +0900Updated at: 2024-04-02 05:17:50 +0900

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