Stabilization of CVD-grown WS2 at elevated temperature with h-BN encapsulation

Xiang Hua; Datong Zhang; Bumho Kim; Dongjea Seo; Kyungnam Kang; Eui-Hyeok Yang; Jiayang Hu; Xianda Chen; Haoran Liang; Kenji Watanabe; Takashi Taniguchi; James Hone; Young Duck Kim; Irving P. Herman

doi:10.1021/acsami.1c06348

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Stabilization of Chemical-Vapor-Deposition-Grown WS2 Monolayers at Elevated Temperature with Hexagonal Boron Nitride Encapsulation
(Stabilization of CVD-grown WS2 at elevated temperature with h-BN encapsulation)

Xiang Hua, Datong Zhang, Bumho Kim, Dongjea Seo, Kyungnam Kang, Eui-Hyeok Yang, Jiayang Hu, Xianda Chen, Haoran Liang, Kenji Watanabe, Takashi Taniguchi, James Hone, Young Duck Kim, Irving P. Herman.

ACS Applied Materials & Interfaces 13 [26] 31271-31278. 2021.

https://doi.org/10.1021/acsami.1c06348

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2021-07-21 03:00:19 +0900更新時刻: 2024-04-02 05:04:40 +0900

Stabilization of Chemical-Vapor-Deposition-Grown WS2 Monolayers at Elevated Temperature with Hexagonal Boron Nitride Encapsulation(Stabilization of CVD-grown WS2 at elevated temperature with h-BN encapsulation)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

Stabilization of Chemical-Vapor-Deposition-Grown WS2 Monolayers at Elevated Temperature with Hexagonal Boron Nitride Encapsulation
(Stabilization of CVD-grown WS2 at elevated temperature with h-BN encapsulation)