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Ion energy distributions and radical densities in a CH4/H2 inductively coupled plasma used for diamond deposition
(CH4/H2誘導結合プラズマのイオンエネルギー分布及びラジカル密度)

OKADA, Katsuyuki, KOMATSU, Shojiro, 松本精一郎, 松本精一郎.

Proc. 25th ICPIG . .

NIMS author(s)

OKADA, Katsuyuki

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2017-02-26 23:58:12 +0900Updated at: 2017-03-17 02:03:28 +0900

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