HOME > 会議録 > 書誌詳細CORRELATION OF ELECTRICAL PROPERTIES WITH INTERFACE STRUCTURES OF CVD OXIDE-BASED OXYNITRIDE TUNNEL DIELECTRICS(CVD酸窒化トンネル膜の電気特性と界面構造の相関)Ziyuan Liu, Hirokazu Ishigaki, Shuu Ito, Takashi Ide, Mariko Makabe, Markus Wilde, Katsuyuki Fukutani, Masahiro Kimura, VLAICU, AurelMihai, YOSHIKAWA, Hideki. Proceedings of the IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP (2009 IIRW FINAL REPORT) 145-146. 2010.NIMS著者吉川 英樹Materials Data Repository (MDR)上の本文・データセット作成時刻 :2017-02-27 01:42:34 +0900 更新時刻 :2017-03-17 03:45:59 +0900