CORRELATION OF ELECTRICAL PROPERTIES WITH INTERFACE STRUCTURES OF CVD OXIDE-BASED OXYNITRIDE TUNNEL DIELECTRICS

CORRELATION OF ELECTRICAL PROPERTIES WITH INTERFACE STRUCTURES OF CVD OXIDE-BASED OXYNITRIDE TUNNEL DIELECTRICS
(CVD酸窒化トンネル膜の電気特性と界面構造の相関)

Ziyuan Liu, Hirokazu Ishigaki, Shuu Ito, Takashi Ide, Mariko Makabe, Markus Wilde, Katsuyuki Fukutani, Masahiro Kimura, VLAICU, AurelMihai, YOSHIKAWA, Hideki.

Proceedings of the IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP (2009 IIRW FINAL REPORT) 145-146. 2010.

NIMS author(s)

YOSHIKAWA, Hideki

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2017-02-27 01:42:34 +0900Updated at: 2017-03-17 03:45:59 +0900

CORRELATION OF ELECTRICAL PROPERTIES WITH INTERFACE STRUCTURES OF CVD OXIDE-BASED OXYNITRIDE TUNNEL DIELECTRICS(CVD酸窒化トンネル膜の電気特性と界面構造の相関)

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

CORRELATION OF ELECTRICAL PROPERTIES WITH INTERFACE STRUCTURES OF CVD OXIDE-BASED OXYNITRIDE TUNNEL DIELECTRICS
(CVD酸窒化トンネル膜の電気特性と界面構造の相関)