HOME > Proceedings > Detail埋もれた界面の化学反応を利用した電子デバイスへのX線反射率測定の応用(Application of x-ray reflectivity measurement to electronic devices using chemical reaction at "buried" interface)石井 真史, Aiko Nakao, 櫻井 健次. JOURNAL OF PHYSICS: CONFERENCE SEIES 012014-1-012014-5. 2007.NIMS author(s)ISHII, MasashiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:25:30 +0900 Updated at: 2017-03-17 04:39:49 +0900