HOME > 会議録 > 書誌詳細Relation between solubility of silicon in high-k oxides and the effect of Fermi level pinningUMEZAWA, Naoto, Kenji Shiraishi, Kuniyuki Kakushima, Hiroshi Iwai, ohmori kenji, Keisaku Yamada, CHIKYOW, Toyohiro. ECS TRANSACTIONS 15-20. 2008.NIMS著者知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 01:28:09 +0900 更新時刻: 2017-03-17 03:29:18 +0900
