HOME > Proceedings > DetailRelation between solubility of silicon in high-k oxides and the effect of Fermi level pinningUMEZAWA, Naoto, Kenji Shiraishi, Kuniyuki Kakushima, Hiroshi Iwai, ohmori kenji, Keisaku Yamada, CHIKYOW, Toyohiro. ECS TRANSACTIONS 15-20. 2008.NIMS author(s)CHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-27 01:28:09 +0900 Updated at: 2017-03-17 03:29:18 +0900