HOME > 会議録 > 書誌詳細Nitride film Growth by Near-Atmospheric Nitrogen Plasma-Assisted Chemical Vapor(窒素大気圧プラズマＣＶＤによる窒化物薄膜成長)NAGATA, Takahiro, HAEMORI, Masamitsu, ANZAI Junichiro, UEHARA Tsuyoshi, CHIKYOW, Toyohiro. TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN 579-582. 2010.NIMS著者長田 貴弘知京 豊裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-27 01:47:06 +0900 更新時刻: 2017-03-17 03:51:14 +0900
