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抵抗変化メモリ(ReRAM)における導電性パス生成機構の検討 〜第一原理分子動力学法を用いたNiOの様々な面方位の表面状態解析〜
(Study on Formative Mechanism of Conductive Path in Resistive Random Access Memory (ReRAM) -Analyses of Various NiO Surface States Using Ab Initio Calculations-)

森山拓洋, 山崎 隆浩, 大野 隆央, 岸田悟, 木下健太郎.

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      Created at: 2017-02-27 02:40:10 +0900Updated at: 2018-05-21 21:45:09 +0900

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