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Moiré nanosphere lithography: use colloidal moiré patterns as masks

Kai Chen, Bharath B. Rajeeva, Zilong Wu, Michael Rukavina, Thang Duy Dao, Satoshi Ishii, Masakazu Aono, Tadaaki Nagao, Yuebing Zheng.

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Materials Data Repository (MDR)上の本文・データセット


    作成時刻: 2017-02-27 02:46:09 +0900更新時刻: 2024-06-03 09:11:05 +0900

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