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Moiré nanosphere lithography: use colloidal moiré patterns as masks

Kai Chen, Bharath B. Rajeeva, Zilong Wu, Michael Rukavina, Thang Duy Dao, Satoshi Ishii, Masakazu Aono, Tadaaki Nagao, Yuebing Zheng.
PROCEEDINGS OF SPIE Plasmonics:Metallic Nanostructures and Their Optical Properties XIII . 2015.
https://doi.org/10.1117/12.2187398

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