HOME > Presentation > Detail
Si/GeおよびGe/Siコアシェルナノワイヤへの選択ドーピングと応力評価
(Characterization of selective doping and stress in Si/Ge and Ge/Si core-shell nanowires)
TNT Japan. 2014.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:05:21 +0900Updated at: 2017-07-10 21:49:58 +0900