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プラズマ酸化過程におけるシリコン表面応力の研究
(Surface Stress in Silicon Oxidelayer made by Plasma Oxidation with Applying Sample Bias)
AVS 45th Internaternational Symposlum. November 02, 1998-November 06, 1998.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:38:51 +0900 Updated at: 2017-07-10 17:50:26 +0900