HOME > Presentation > DetailSi/GeおよびGe/Siコアシェルナノワイヤ中の選択ドーピングと応力評価(Characterization of selective doping and stress in Si/Ge and Ge/Si core-shell nanowires)深田 直樹, 三留 正則, 関口 隆史, 板東 義雄, Melanie Kirkham, Jung-il Hong, Zhong Lin Wang, Robert Snyder. NANOWIRES2013. 2013.NIMS author(s)FUKATA, NaokiMITOME, MasanoriBANDO, YoshioFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 03:57:55 +0900Updated at: 2017-07-10 21:39:21 +0900