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Si/GeおよびGe/Siコアシェルナノワイヤ中の選択ドーピングと応力評価
(Characterization of selective doping and stress in Si/Ge and Ge/Si core-shell nanowires)

深田 直樹, 三留 正則, 関口 隆史, 板東 義雄, Melanie Kirkham, Jung-il Hong, Zhong Lin Wang, Robert Snyder.
NANOWIRES2013. 2013.

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Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-01-08 03:57:55 +0900Updated at: 2017-07-10 21:39:21 +0900

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