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水素終端Si(100)-(2x1)表面における原子の拡散のメカニズム
(Diffusion Mechanism of Ge atoms on H/Si(100)-(2x1) Surface)
International Joint Conference on Silica Epitaxy and Heterostruc. September 12, 1999-September 17, 1999.
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Created at: 2017-02-18 01:52:33 +0900 Updated at: 2017-07-10 18:01:36 +0900