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SiOCH膜の膜特性へのSi-H原子団除去効果:理論的研究
(Si-H Group Elimination Effect on the Properties of SiOCH Films: Theoretical Study)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:11:00 +0900Updated at: 2017-07-10 20:18:02 +0900