SAMURAI - NIMS Researchers Database

HOME > Presentation > Detail

SiOCH膜の膜特性へのSi-H原子団除去効果:理論的研究
(Si-H Group Elimination Effect on the Properties of SiOCH Films: Theoretical Study)

田島 暢夫, 大野 隆央, 神力学, 徐永華.
SSDM 2008. 2008.

NIMS author(s)


    Fulltext and dataset(s) on Materials Data Repository (MDR)


      Created at: 2017-01-08 04:11:00 +0900Updated at: 2017-07-10 20:18:02 +0900

      ▲ Go to the top of this page