HOME > 口頭発表 > 書誌詳細Silicon-doped indium oxide – a promising amorphous oxide semiconductor material for thin-film transistor fabricated by spin coating methodHa Hoang, Kazutaka Sasaki, Tatsuki Hori1, TSUKAGOSHI, Kazuhito, NABATAME, Toshihide, Bui Nguyen Quoc Trinh. International Conference on Materials Engineering and Nano Sciences (ICMENS 2019). 2019.NIMS著者塚越 一仁生田目 俊秀Materials Data Repository (MDR)上の本文・データセット作成時刻: 2019-06-07 03:00:20 +0900更新時刻: 2019-06-07 03:00:20 +0900