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Silicon-doped indium oxide – a promising amorphous oxide semiconductor material for thin-film transistor fabricated by spin coating method

Ha Hoang, Kazutaka Sasaki, Tatsuki Hori1, TSUKAGOSHI, Kazuhito, NABATAME, Toshihide, Bui Nguyen Quoc Trinh.
International Conference on Materials Engineering and Nano Sciences (ICMENS 2019). 2019.

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    作成時刻: 2019-06-07 03:00:20 +0900更新時刻: 2019-06-07 03:00:20 +0900

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