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酸化中のシリコン表面応力と基板表面粗さとの関連
(The Effect of Substrate Roughness on Surface Stress in Vltrathin Oxide on Si)
第４回薄膜表面物理研究会. January 22, 1999-January 23, 1999.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:12:13 +0900 Updated at: 2017-07-10 17:53:50 +0900