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反応性スパッタ法を用いたエピタキシャルAlN膜の成長条件の検討
(Growth condition optimization of epitaxial AlN film deposited by reactive sputtering)
STAC-10. August 01, 2017-August 03, 2017.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-07-29 22:52:14 +0900 Updated at: 2018-06-05 14:11:22 +0900